Fmoc-pentafluoro-L-phenylalanine

We report the results of a VAMAS (Versailles Project on Advanced Materials and Standards) interlaboratory study on the measurement of composition in organic depth profiling. Layered samples with known binary compositions of Irganox 1010 and either Irganox 1098 or Fmoc-pentafluoro-l-phenylalanine in each layer were manufactured in a single batch and distributed to more than 20 participating laboratories. The samples were analyzed using argon cluster ion sputtering and either X-ray photoelectron spectroscopy (XPS) or time-of-flight secondary ion mass spectrometry (ToF-SIMS) to generate depth profiles. Participants were asked to estimate the volume fractions in two of the layers and were provided with the compositions of all other layers. Participants using XPS provided volume fractions within 0.03 of the nominal values. Participants using ToF-SIMS either made no attempt, or used various methods that gave results ranging in error from 0.02 to over 0.10 in volume fraction, the latter representing a 50% relative error for a nominal volume fraction of 0.2. Error was predominantly caused by inadequacy in the ability to compensate for primary ion intensity variations and the matrix effect in SIMS. Matrix effects in these materials appear to be more pronounced as the number of atoms in both the primary analytical ion and the secondary ion increase. Using the participants' data we show that organic SIMS matrix effects can be measured and are remarkably consistent between instruments. We provide recommendations for identifying and compensating for matrix effects. Finally, we demonstrate, using a simple normalization method, that virtually all ToF-SIMS participants could have obtained estimates of volume fraction that were at least as accurate and consistent as XPS.

Rationale: Matrix effects cause a nonlinear relationship between ion intensities and concentrations in mass spectrometry, including time-of-flight secondary ion mass spectrometry (ToF-SIMS). Here, two artificial neural network (ANN)-based methods, autoencoder-based and simple ANN methods, were employed for the quantitative and qualitative analyses of a two organic compound mixture via ToF-SIMS. Methods: The multilayer model sample contained a mixture of Irganox 1010 and Fmoc-pentafluoro-L-phenylalanine (Fmoc-PFLPA). The sample's positive and negative ion depth profiles were collected through ToF-SIMS. ToF-SIMS-derived cross-sectional image datasets were analyzed using three unsupervised methods, namely principal component analysis (PCA), multivariate curve resolution (MCR), and use of a sparse autoencoder (SAE). The supervised simple ANN method was optimized based on the spectra and validated by predicting the test dataset ratios of Irganox 1010. Results: The results obtained using the SAE demonstrated linear calibration curves and appropriate material distribution images. The Irganox 1010 and Fmoc-PFLPA positive and negative ion datasets exhibited >0.97 correlation coefficients. The PCA and MCR results demonstrated lower linearity than that of SAE. Moreover, SAE weights indicated the ions important for each organic compound. The simple ANN method accurately predicted the ratios in the test dataset and indicated the important ions. Conclusions: Both the supervised and unsupervised methods based on ANN, which were employed in regulating nonlinear relationships, were effective in the quantitative and qualitative analyses of the ToF-SIMS data of the two organic compound mixtures. Regarding qualitative analysis, both ANN-based methods indicated specific ions from the molecules in the sample.

The sputtering yield volumes of binary mixtures of Irganox 1010 with either Irganox 1098 or Fmoc-pentafluoro-L-phenylalanine (FMOC) have been measured for 5 keV Ar2000(+) ions incident at 45° to the surface normal. The sputtering yields are determined from the doses to sputter through various compositions of 100 nm thick, intimately mixed, layers. Because of matrix effects, the profiles for secondary ions are distorted, and profile shifts in depth of 15 nm are observed leading to errors above 20% in the deduced sputtering yield. Secondary ions are selected to avoid this. The sputtering yield volumes for the mixtures are shown to be lower than those deduced from a linear interpolation from the pure materials. This is shown to be consistent with a simple model involving the changing energy absorbed for the sputtering of intimate mixtures. Evidence to support this comes from the secondary ion data for pairs of the different molecules. Both binary mixtures behave similarly, but matrix effects are stronger for the Irganox 1010/FMOC system.